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CATS™ is the most advanced and fully featured data preparation software available for semiconductor photomask manufacturing. We have applications for inspection, metrology and for direct-write-on-wafer. CATS is the most powerful and flexible software package of its kind. Our programming staff has repeatedly visited virtually every mask writing tool manufacturer in the world. Utilizing this intimate knowledge, CATS offers hierarchical processing of design data with the utmost compatibility for each machine format. CATS minimizes turnaround time and maximizes the quality of today's high-end masks. Product Specifics |
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